|
|
|
3312 - CVC Sputtering System
Sputter up system currently set up for 8" substrates, Process chamber heaters, single Process Chamber, Ion Mill, Two Process Targets: 3kW 8" RF and 5KW DC, Techware system controller, 3 mass flow controllers.
Home Products About PCE Contact PCE © 2004 Pacific Capital Equipment. All rights reserved. Pacific Capital Equipment and the Pacific Capital Equipment logo are registered trademarks of Pacific Capital Equipment. No portion of this site may be copied, retransmitted, reposted, duplicated or otherwise used without the express written permission of Pacific Capital Equipment. |
